The vacuum coating process is divided into a variety of processes, including vacuum magnetron sputtering, evaporation and optical ion plating. Now mainly talk about the principle and advantages and disadvantages of magnetron sputtering coating, let everyone know about this plating process, and help the selection process of product plating.

Vacuum magnetron sputtering coating

First of all, vacuum magnetron sputtering coating is usually applied to metal products. The principle is that under the action of electric field, electrons collide with argon atoms, thereby generating a large amount of argon ions and electrons. Argon ions accelerate the bombardment of targets, and target atom deposition substrates. The surface is formed into a film. The material of the target mainly includes metal targets, metal oxide targets and the like.

Each process has advantages and disadvantages. The advantage of vacuum magnetron sputtering coating is that it has high purity, good adhesion and uniform film thickness, and the process repeatability is better. Of course, the disadvantages must also be paid attention to. Due to the complexity of the equipment structure, if the sputtering target is penetrated, the entire target will be scrapped, so the low utilization of the target is a disadvantage.